biostudies-literatureUnknown7Yu HFacile fabrication of highly conductive and self-encapsulated graphene electronics is in urgent demand for carbon-based integrated circuits, field effect transistors, optoelectronic devices, and flexible sensors. The current fabrication of these electronic devices is mainly based on layer-by-layer techniques (separate circuit preparation and encapsulation procedures), which show multistep fabrication procedures, complicated renovation/repair procedures, and poor electrical property due to graphene oxidation and exfoliation. Here, we propose a laser-guided interfacial writing (LaserIW) technique based on self-confined, nickel-catalyzed graphitization to directly fabricate highly conductive, embedded graphene electronics inside multilayer structures. The doped nickel is used to induce chain Research (Washington, D.C.)0305https://www.ebi.ac.uk/biostudies/studies/S-EPMC11020139biostudies-literatureLaser-Guided, Self-Confined Graphitization for High-Conductivity Embedded Electronics.PMC11020139Huang YChen FBian JLi KYu HfalseLaser-Guided, Self-Confined Graphitization for High-Conductivity Embedded Electronics.Facile fabrication of highly conductive and self-encapsulated graphene electronics is in urgent demand for carbon-based integrated circuits, field effect transistors, optoelectronic devices, and flexible sensors. The current fabrication of these electronic devices is mainly based on layer-by-layer techniques (separate circuit preparation and encapsulation procedures), which show multistep fabrication procedures, complicated renovation/repair procedures, and poor electrical property due to graphene oxidation and exfoliation. Here, we propose a laser-guided interfacial writing (LaserIW) technique based on self-confined, nickel-catalyzed graphitization to directly fabricate highly conductive, embedded graphene electronics inside multilayer structures. The doped nickel is used to induce chain 2024-01-01T00:00:00Z20242025-04-04T12:58:40.467Z2025-04-04T12:58:40.467ZS-EPMC110201393862835410.34133/research.0305