{"database":"biostudies-literature","file_versions":[],"scores":null,"additional":{"omics_type":["Unknown"],"volume":["11(25)"],"submitter":["Hernandha RFH"],"funding":["National Science and Technology Council, Taiwan","National Science and Technology Council"],"pubmed_abstract":["To enhance Li storage properties, nitrogenation methods are developed for Si anodes. First, melamine, urea, and nitric oxide (NO) precursors are used to nitrogenize carbon-coated Si particles. The properties of the obtained particles are compared. It is found that the NO process can maximize the graphitic nitrogen (N) content and electronic conductivity of a sample. In addition, optimized N functional groups and O─C species on the electrode surface increase electrolyte wettability. However, with a carbon barrier layer, NO hardly nitrogenizes the Si cores. Therefore, bare Si particles are reacted with NO. Core-shell Si@amorphous SiN<sub>x</sub> particles are produced using a facile and scalable NO treatment route. The effects of the NO reaction time on the physicochemical properties and cha"],"journal":["Advanced science (Weinheim, Baden-Wurttemberg, Germany)"],"pagination":["e2310062"],"full_dataset_link":["https://www.ebi.ac.uk/biostudies/studies/S-EPMC11220681"],"repository":["biostudies-literature"],"pubmed_title":["Double Nitrogenation Layer Formed Using Nitric Oxide for Enhancing Li<sup>+</sup> Storage Performance, Cycling Stability, and Safety of Si Electrodes."],"pmcid":["PMC11220681"],"pubmed_authors":["Umesh B","Li J","Chang JK","Hernandha RFH","Patra J","Hsieh CT","Tseng CJ"],"additional_accession":[]},"is_claimable":false,"name":"Double Nitrogenation Layer Formed Using Nitric Oxide for Enhancing Li<sup>+</sup> Storage Performance, Cycling Stability, and Safety of Si Electrodes.","description":"To enhance Li storage properties, nitrogenation methods are developed for Si anodes. First, melamine, urea, and nitric oxide (NO) precursors are used to nitrogenize carbon-coated Si particles. The properties of the obtained particles are compared. It is found that the NO process can maximize the graphitic nitrogen (N) content and electronic conductivity of a sample. In addition, optimized N functional groups and O─C species on the electrode surface increase electrolyte wettability. However, with a carbon barrier layer, NO hardly nitrogenizes the Si cores. Therefore, bare Si particles are reacted with NO. Core-shell Si@amorphous SiN<sub>x</sub> particles are produced using a facile and scalable NO treatment route. The effects of the NO reaction time on the physicochemical properties and cha","dates":{"release":"2024-01-01T00:00:00Z","publication":"2024 Jul","modification":"2025-04-21T16:14:54.979Z","creation":"2025-04-21T16:14:54.979Z"},"accession":"S-EPMC11220681","cross_references":{"pubmed":["38654688"],"doi":["10.1002/advs.202310062"]}}