<HashMap><database>biostudies-literature</database><scores/><additional><omics_type>Unknown</omics_type><volume>14(32)</volume><submitter>Liu X</submitter><pubmed_abstract>The Ag &lt;sub>&lt;i>x&lt;/i>&lt;/sub> O thin film with various oxygen flow ratios (&lt;i>R&lt;/i>[O&lt;sub>2&lt;/sub>]%) deposited by radio frequency magnetron sputtering (RFM-SPT) has been studied. While adjusting &lt;i>R&lt;/i>[O&lt;sub>2&lt;/sub>]% from 0% to 30%, the Ag &lt;sub>&lt;i>x&lt;/i>&lt;/sub> O thin film transitioned from metal to semiconductor and/or insulator with different transparent appearances on the surface observed using X-ray diffraction (XRD) and transmittance measurement. At high oxygen flow ratios, the Ag &lt;sub>&lt;i>x&lt;/i>&lt;/sub> O film is multi-phased as a mixture of Ag&lt;sup>(II)&lt;/sup>O and Ag&lt;sub>2&lt;/sub> &lt;sup>(III)&lt;/sup>O&lt;sub>3&lt;/sub>. In addition, the work function (&lt;i>ϕ&lt;/i>) of those samples changes from 4.7 eV to 5.6 eV as measured by photoelectron yield spectroscopy (PYS). The compositional and chemical state ch</pubmed_abstract><journal>RSC advances</journal><pagination>23215-23224</pagination><full_dataset_link>https://www.ebi.ac.uk/biostudies/studies/S-EPMC11264336</full_dataset_link><repository>biostudies-literature</repository><pubmed_title>The effects of oxygen flow ratio on the properties of Ag &lt;sub>&lt;i>x&lt;/i>&lt;/sub> O thin films grown by radio frequency magnetron sputtering.</pubmed_title><pmcid>PMC11264336</pmcid><pubmed_authors>Liu X</pubmed_authors><pubmed_authors>Yasuoka T</pubmed_authors><pubmed_authors>Liu L</pubmed_authors><pubmed_authors>Kawaharamura T</pubmed_authors><pubmed_authors>Dang GT</pubmed_authors></additional><is_claimable>false</is_claimable><name>The effects of oxygen flow ratio on the properties of Ag &lt;sub>&lt;i>x&lt;/i>&lt;/sub> O thin films grown by radio frequency magnetron sputtering.</name><description>The Ag &lt;sub>&lt;i>x&lt;/i>&lt;/sub> O thin film with various oxygen flow ratios (&lt;i>R&lt;/i>[O&lt;sub>2&lt;/sub>]%) deposited by radio frequency magnetron sputtering (RFM-SPT) has been studied. While adjusting &lt;i>R&lt;/i>[O&lt;sub>2&lt;/sub>]% from 0% to 30%, the Ag &lt;sub>&lt;i>x&lt;/i>&lt;/sub> O thin film transitioned from metal to semiconductor and/or insulator with different transparent appearances on the surface observed using X-ray diffraction (XRD) and transmittance measurement. At high oxygen flow ratios, the Ag &lt;sub>&lt;i>x&lt;/i>&lt;/sub> O film is multi-phased as a mixture of Ag&lt;sup>(II)&lt;/sup>O and Ag&lt;sub>2&lt;/sub> &lt;sup>(III)&lt;/sup>O&lt;sub>3&lt;/sub>. In addition, the work function (&lt;i>ϕ&lt;/i>) of those samples changes from 4.7 eV to 5.6 eV as measured by photoelectron yield spectroscopy (PYS). The compositional and chemical state ch</description><dates><release>2024-01-01T00:00:00Z</release><publication>2024 Jul</publication><modification>2025-06-01T01:16:04.508Z</modification><creation>2025-06-01T01:16:04.508Z</creation></dates><accession>S-EPMC11264336</accession><cross_references><pubmed>39045400</pubmed><doi>10.1039/d4ra02039a</doi></cross_references></HashMap>