{"database":"biostudies-literature","file_versions":[],"scores":null,"additional":{"omics_type":["Unknown"],"volume":["9(35)"],"submitter":["Oh HT"],"pubmed_abstract":["This study focuses on the discovery of a single-component molecular resist for extreme ultraviolet (EUV) lithography by employing the ionizing radiation-induced decomposition of carbon-fluorine chemical bonds. The target material, <b>DHP-L6</b>, was synthesized by bonding perfluoroalkyl ether moieties to amorphous dendritic hexaphenol (DHP) with a high glass transition temperature. Upon exposure to EUV and electron beam irradiation, <b>DHP-L6</b> films exhibited a decreasing solubility in fluorous developer media, resulting in negative-tone images. The underlying chemical mechanisms were elucidated by Fourier transform-infrared spectroscopy (FT-IR), X-ray photoelectron spectroscopy, and nanoindentation experiments. These analyses highlighted the possible electron-induced decomposition of C-F bonds in <b>DHP-L6</b>, leading to molecular network formation via recombination of the resulting C-centered radicals. Subsequent high-resolution lithographic patterning under EUV irradiation showed that <b>DHP-L6</b> could create stencil patterns with a line width of 26 nm at an exposure dose of 110 mJ cm<sup>-2</sup>. These results confirm that single-component small molecular compounds with fluoroalkyl moieties can be employed as patterning materials under ionizing radiation. Nonetheless, additional research is required to reduce the relatively high exposure energy for high-resolution patterning and to enhance the line-edge roughness of the produced stencil."],"journal":["ACS omega"],"pagination":["37365-37373"],"full_dataset_link":["https://www.ebi.ac.uk/biostudies/studies/S-EPMC11375697"],"repository":["biostudies-literature"],"pubmed_title":["Solubility Change Behavior of Fluoroalkyl Ether-Tagged Dendritic Hexaphenol under Extreme UV Exposure."],"pmcid":["PMC11375697"],"pubmed_authors":["Jung SH","Ku Y","Lee S","Koh C","Kim G","Nishi T","Kim HW","Lee JK","Kim K","Oh HT","Park BG"],"additional_accession":[]},"is_claimable":false,"name":"Solubility Change Behavior of Fluoroalkyl Ether-Tagged Dendritic Hexaphenol under Extreme UV Exposure.","description":"This study focuses on the discovery of a single-component molecular resist for extreme ultraviolet (EUV) lithography by employing the ionizing radiation-induced decomposition of carbon-fluorine chemical bonds. The target material, <b>DHP-L6</b>, was synthesized by bonding perfluoroalkyl ether moieties to amorphous dendritic hexaphenol (DHP) with a high glass transition temperature. Upon exposure to EUV and electron beam irradiation, <b>DHP-L6</b> films exhibited a decreasing solubility in fluorous developer media, resulting in negative-tone images. The underlying chemical mechanisms were elucidated by Fourier transform-infrared spectroscopy (FT-IR), X-ray photoelectron spectroscopy, and nanoindentation experiments. These analyses highlighted the possible electron-induced decomposition of C-F bonds in <b>DHP-L6</b>, leading to molecular network formation via recombination of the resulting C-centered radicals. Subsequent high-resolution lithographic patterning under EUV irradiation showed that <b>DHP-L6</b> could create stencil patterns with a line width of 26 nm at an exposure dose of 110 mJ cm<sup>-2</sup>. These results confirm that single-component small molecular compounds with fluoroalkyl moieties can be employed as patterning materials under ionizing radiation. Nonetheless, additional research is required to reduce the relatively high exposure energy for high-resolution patterning and to enhance the line-edge roughness of the produced stencil.","dates":{"release":"2024-01-01T00:00:00Z","publication":"2024 Sep","modification":"2025-04-19T12:40:21.899Z","creation":"2025-04-19T12:40:21.899Z"},"accession":"S-EPMC11375697","cross_references":{"pubmed":["39246471"],"doi":["10.1021/acsomega.4c05535"]}}