biostudies-literatureUnknown11(3)Liu YSilica microlens arrays (MLAs) with multiple numerical-apertures (NAs) have high thermal and mechanical stability, and have potential application prospects in 3D display and rapid detection. However, it is still a challenge to rapidly fabricate silica MLAs with a larger range of NAs and how to obtain multiple NAs in the same aperture diameter. Here, a wet etching assisted spatially modulated femtosecond laser pulse fabricating technology is proposed. In this technology, Gaussian laser pulse is modulated in the axial direction to create a pulse with a large aspect ratio, which is used to modify the silica to obtain a longer modification distance than traditional technology. After that, a microlens with a larger NA can be obtained by etching, and the NA variable range can be up to 0.06-0.65,Nanophotonics (Berlin, Germany)571-581https://www.ebi.ac.uk/biostudies/studies/S-EPMC11501908biostudies-literatureMorphology adjustable microlens array fabricated by single spatially modulated femtosecond pulse.PMC11501908Liu YLi XYao ZHuang JZhou SWang ZQin BfalseMorphology adjustable microlens array fabricated by single spatially modulated femtosecond pulse.Silica microlens arrays (MLAs) with multiple numerical-apertures (NAs) have high thermal and mechanical stability, and have potential application prospects in 3D display and rapid detection. However, it is still a challenge to rapidly fabricate silica MLAs with a larger range of NAs and how to obtain multiple NAs in the same aperture diameter. Here, a wet etching assisted spatially modulated femtosecond laser pulse fabricating technology is proposed. In this technology, Gaussian laser pulse is modulated in the axial direction to create a pulse with a large aspect ratio, which is used to modify the silica to obtain a longer modification distance than traditional technology. After that, a microlens with a larger NA can be obtained by etching, and the NA variable range can be up to 0.06-0.65,2022-01-01T00:00:00Z2022 Jan2025-04-27T02:15:32.45Z2025-04-06T18:30:48.531ZS-EPMC115019083963379510.1515/nanoph-2021-0629