<HashMap><database>biostudies-literature</database><scores/><additional><submitter>Chen Z</submitter><funding>Natural Science Foundation of Beijing Municipality (Beijing Natural Science Foundation)</funding><funding>National Natural Science Foundation of China (National Science Foundation of China)</funding><pagination>251</pagination><full_dataset_link>https://www.ebi.ac.uk/biostudies/studies/S-EPMC12290042</full_dataset_link><repository>biostudies-literature</repository><omics_type>Unknown</omics_type><volume>14(1)</volume><pubmed_abstract>Recently, colloidal quantum dots (QDs) with high luminescent efficiency and tunable colors have become ideal materials for next-generation display devices. Direct photolithography is a powerful tool for patterning QD devices, but it faces the serious issue of degradation in the photophysical properties of the patterned QDs. Here, we use relatively rigid cyclopentane as a bridging group to design the crosslinker CPTA, achieving high-resolution direct photolithography of QDs with nearly nondestructive under ambient conditions. The key to the crosslinker design is the introduction of a rigid bridging group that elevates the LUMO level, providing a stronger energy barrier to prevent QD electrons from being trapped or undergoing non-radiative recombination, thus preserving their PL and EL prope</pubmed_abstract><journal>Light, science &amp; applications</journal><pubmed_title>Rigid crosslinker-assisted nondestructive direct photolithograph for patterned QLED displays.</pubmed_title><pmcid>PMC12290042</pmcid><funding_grant_id>22405016</funding_grant_id><funding_grant_id>Z220007</funding_grant_id><pubmed_authors>Rao S</pubmed_authors><pubmed_authors>Chen Z</pubmed_authors><pubmed_authors>Wang S</pubmed_authors><pubmed_authors>Tang A</pubmed_authors><pubmed_authors>Teng F</pubmed_authors><pubmed_authors>Zhao J</pubmed_authors><pubmed_authors>Zhang R</pubmed_authors><pubmed_authors>Man Z</pubmed_authors></additional><is_claimable>false</is_claimable><name>Rigid crosslinker-assisted nondestructive direct photolithograph for patterned QLED displays.</name><description>Recently, colloidal quantum dots (QDs) with high luminescent efficiency and tunable colors have become ideal materials for next-generation display devices. Direct photolithography is a powerful tool for patterning QD devices, but it faces the serious issue of degradation in the photophysical properties of the patterned QDs. Here, we use relatively rigid cyclopentane as a bridging group to design the crosslinker CPTA, achieving high-resolution direct photolithography of QDs with nearly nondestructive under ambient conditions. The key to the crosslinker design is the introduction of a rigid bridging group that elevates the LUMO level, providing a stronger energy barrier to prevent QD electrons from being trapped or undergoing non-radiative recombination, thus preserving their PL and EL prope</description><dates><release>2025-01-01T00:00:00Z</release><publication>2025 Jul</publication><modification>2026-03-15T17:18:21.168Z</modification><creation>2025-08-13T03:04:09.069Z</creation></dates><accession>S-EPMC12290042</accession><cross_references><pubmed>40707459</pubmed><doi>10.1038/s41377-025-01918-7</doi></cross_references></HashMap>