<HashMap><database>biostudies-literature</database><scores/><additional><omics_type>Unknown</omics_type><volume>15(1)</volume><submitter>Lee YF</submitter><pubmed_abstract>Cu-Cu direct bonding using electroplated ultrafine-grain Cu (107.24 nm) was studied in air at 110-150 °C. Unstable grain boundaries enabled ultrafast grain growth across the bonding interface, analyzed via coincidence site lattice (CSL) boundaries using EBSD. Above 125 °C, the Σ3 boundary length exceeded 40%, while below 120 °C it rapidly declined, transforming into Σ27a, indicating a critical transition dominated by the {115} plane. A temperature-time-dependent grain growth model was developed, incorporating CSL effects. Simulations showed grain evolution and timing of CSL boundary formation, with transition times from 316 to 190 s as temperature increased.</pubmed_abstract><journal>Scientific reports</journal><pagination>30978</pagination><full_dataset_link>https://www.ebi.ac.uk/biostudies/studies/S-EPMC12373834</full_dataset_link><repository>biostudies-literature</repository><pubmed_title>Grain boundary motions of low temperature and low pressure copper to copper direct bonding by electroplating ultra-fine-grain (UFG) Cu.</pubmed_title><pmcid>PMC12373834</pmcid><pubmed_authors>Chen PY</pubmed_authors><pubmed_authors>Cheng TY</pubmed_authors><pubmed_authors>Huang YC</pubmed_authors><pubmed_authors>Lin KC</pubmed_authors><pubmed_authors>Huang WC</pubmed_authors><pubmed_authors>Chang JS</pubmed_authors><pubmed_authors>Lee YF</pubmed_authors><pubmed_authors>Su YC</pubmed_authors><pubmed_authors>Lin CL</pubmed_authors><pubmed_authors>Chiu CY</pubmed_authors><pubmed_authors>Liu CY</pubmed_authors><pubmed_authors>Chiu CW</pubmed_authors><pubmed_authors>Yang LH</pubmed_authors><pubmed_authors>Hsieh HC</pubmed_authors><pubmed_authors>Yu ZY</pubmed_authors><pubmed_authors>Lo MH</pubmed_authors><pubmed_authors>Pan SA</pubmed_authors><pubmed_authors>Lin CH</pubmed_authors><pubmed_authors>Hsu CE</pubmed_authors></additional><is_claimable>false</is_claimable><name>Grain boundary motions of low temperature and low pressure copper to copper direct bonding by electroplating ultra-fine-grain (UFG) Cu.</name><description>Cu-Cu direct bonding using electroplated ultrafine-grain Cu (107.24 nm) was studied in air at 110-150 °C. Unstable grain boundaries enabled ultrafast grain growth across the bonding interface, analyzed via coincidence site lattice (CSL) boundaries using EBSD. Above 125 °C, the Σ3 boundary length exceeded 40%, while below 120 °C it rapidly declined, transforming into Σ27a, indicating a critical transition dominated by the {115} plane. A temperature-time-dependent grain growth model was developed, incorporating CSL effects. Simulations showed grain evolution and timing of CSL boundary formation, with transition times from 316 to 190 s as temperature increased.</description><dates><release>2025-01-01T00:00:00Z</release><publication>2025 Aug</publication><modification>2026-05-03T03:08:40.308Z</modification><creation>2026-05-03T03:06:00.253Z</creation></dates><accession>S-EPMC12373834</accession><cross_references><pubmed>40847129</pubmed><doi>10.1038/s41598-025-17058-2</doi></cross_references></HashMap>