<HashMap><database>biostudies-literature</database><scores/><additional><omics_type>Unknown</omics_type><volume>111(40)</volume><submitter>Zhou M</submitter><pubmed_abstract>Formation of topological quantum phase on a conventional semiconductor surface is of both scientific and technological interest. Here, we demonstrate epitaxial growth of 2D topological insulator, i.e., quantum spin Hall state, on Si(111) surface with a large energy gap, based on first-principles calculations. We show that the Si(111) surface functionalized with one-third monolayer of halogen atoms [Si(111)-√3 x √3 -X (X = Cl, Br, I)] exhibiting a trigonal superstructure provides an ideal template for epitaxial growth of heavy metals, such as Bi, which self-assemble into a hexagonal lattice with high kinetic and thermodynamic stability. Most remarkably, the Bi overlayer is atomically bonded to but electronically decoupled from the underlying Si substrate, exhibiting isolated quantum spin Ha</pubmed_abstract><journal>Proceedings of the National Academy of Sciences of the United States of America</journal><pagination>14378-81</pagination><full_dataset_link>https://www.ebi.ac.uk/biostudies/studies/S-EPMC4210051</full_dataset_link><repository>biostudies-literature</repository><pubmed_title>Epitaxial growth of large-gap quantum spin Hall insulator on semiconductor surface.</pubmed_title><pmcid>PMC4210051</pmcid><pubmed_authors>Zhou M</pubmed_authors><pubmed_authors>Liu Z</pubmed_authors><pubmed_authors>Li P</pubmed_authors><pubmed_authors>Ming W</pubmed_authors><pubmed_authors>Wang Z</pubmed_authors><pubmed_authors>Liu F</pubmed_authors></additional><is_claimable>false</is_claimable><name>Epitaxial growth of large-gap quantum spin Hall insulator on semiconductor surface.</name><description>Formation of topological quantum phase on a conventional semiconductor surface is of both scientific and technological interest. Here, we demonstrate epitaxial growth of 2D topological insulator, i.e., quantum spin Hall state, on Si(111) surface with a large energy gap, based on first-principles calculations. We show that the Si(111) surface functionalized with one-third monolayer of halogen atoms [Si(111)-√3 x √3 -X (X = Cl, Br, I)] exhibiting a trigonal superstructure provides an ideal template for epitaxial growth of heavy metals, such as Bi, which self-assemble into a hexagonal lattice with high kinetic and thermodynamic stability. Most remarkably, the Bi overlayer is atomically bonded to but electronically decoupled from the underlying Si substrate, exhibiting isolated quantum spin Ha</description><dates><release>2014-01-01T00:00:00Z</release><publication>2014 Oct</publication><modification>2025-04-22T21:08:31.666Z</modification><creation>2019-03-27T01:38:22Z</creation></dates><accession>S-EPMC4210051</accession><cross_references><pubmed>25246584</pubmed><doi>10.1073/pnas.1409701111</doi></cross_references></HashMap>