<HashMap><database>biostudies-literature</database><scores/><additional><omics_type>Unknown</omics_type><volume>5</volume><submitter>Shin HW</submitter><pubmed_abstract>One-dimensional crystal growth enables the epitaxial integration of III-V compound semiconductors onto a silicon (Si) substrate despite significant lattice mismatch. Here, we report a short-wavelength infrared (SWIR, 1.4-3 μm) photodetector that employs InAs nanowires (NWs) grown on Si. The wafer-scale epitaxial InAs NWs form on the Si substrate without a metal catalyst or pattern assistance; thus, the growth is free of metal-atom-induced contaminations, and is also cost-effective. InAs NW arrays with an average height of 50 μm provide excellent anti-reflective and light trapping properties over a wide wavelength range. The photodetector exhibits a peak detectivity of 1.9 × 10(8) cm · Hz(1/2)/W for the SWIR band at 77 K and operates at temperatures as high as 220 K. The SWIR photodetector on the Si platform demonstrated in this study is promising for future low-cost optical sensors and Si photonics.</pubmed_abstract><journal>Scientific reports</journal><pagination>10764</pagination><full_dataset_link>https://www.ebi.ac.uk/biostudies/studies/S-EPMC4451803</full_dataset_link><repository>biostudies-literature</repository><pubmed_title>Short-wavelength infrared photodetector on Si employing strain-induced growth of very tall InAs nanowire arrays.</pubmed_title><pmcid>PMC4451803</pmcid><pubmed_authors>Bae MH</pubmed_authors><pubmed_authors>Kim DG</pubmed_authors><pubmed_authors>Choi WJ</pubmed_authors><pubmed_authors>Shin HW</pubmed_authors><pubmed_authors>Lee SJ</pubmed_authors><pubmed_authors>Choi KJ</pubmed_authors><pubmed_authors>Choe JW</pubmed_authors><pubmed_authors>Shin JC</pubmed_authors><pubmed_authors>Heo J</pubmed_authors></additional><is_claimable>false</is_claimable><name>Short-wavelength infrared photodetector on Si employing strain-induced growth of very tall InAs nanowire arrays.</name><description>One-dimensional crystal growth enables the epitaxial integration of III-V compound semiconductors onto a silicon (Si) substrate despite significant lattice mismatch. Here, we report a short-wavelength infrared (SWIR, 1.4-3 μm) photodetector that employs InAs nanowires (NWs) grown on Si. The wafer-scale epitaxial InAs NWs form on the Si substrate without a metal catalyst or pattern assistance; thus, the growth is free of metal-atom-induced contaminations, and is also cost-effective. InAs NW arrays with an average height of 50 μm provide excellent anti-reflective and light trapping properties over a wide wavelength range. The photodetector exhibits a peak detectivity of 1.9 × 10(8) cm · Hz(1/2)/W for the SWIR band at 77 K and operates at temperatures as high as 220 K. The SWIR photodetector on the Si platform demonstrated in this study is promising for future low-cost optical sensors and Si photonics.</description><dates><release>2015-01-01T00:00:00Z</release><publication>2015 Jun</publication><modification>2025-04-26T08:00:17.195Z</modification><creation>2019-03-27T01:52:35Z</creation></dates><accession>S-EPMC4451803</accession><cross_references><pubmed>26035286</pubmed><doi>10.1038/srep10764</doi></cross_references></HashMap>