<HashMap><database>biostudies-literature</database><scores/><additional><submitter>Sistani M</submitter><funding>Austrian Science Fund FWF</funding><funding>European Research Council</funding><funding>Campus France</funding><funding>Agence Nationale de la Recherche</funding><funding>LABoratoires d&amp;apos;EXcellence ARCANE</funding><funding>Engineering and Physical Sciences Research Council</funding><pagination>1642-1648</pagination><full_dataset_link>https://www.ebi.ac.uk/biostudies/studies/S-EPMC7366502</full_dataset_link><repository>biostudies-literature</repository><omics_type>Unknown</omics_type><volume>7(7)</volume><pubmed_abstract>Recent advances in guiding and localizing light at the nanoscale exposed the enormous potential of ultrascaled plasmonic devices. In this context, the decay of surface plasmons to hot carriers triggers a variety of applications in boosting the efficiency of energy-harvesting, photocatalysis, and photodetection. However, a detailed understanding of plasmonic hot carrier generation and, particularly, the transfer at metal-semiconductor interfaces is still elusive. In this paper, we introduce a monolithic metal-semiconductor (Al-Ge) heterostructure device, providing a platform to examine surface plasmon decay and hot electron transfer at an atomically sharp Schottky nanojunction. The gated metal-semiconductor heterojunction device features electrostatic control of the Schottky barrier height at the Al-Ge interface, enabling hot electron filtering. The ability of momentum matching and to control the energy distribution of plasmon-driven hot electron injection is demonstrated by controlling the interband electron transfer in Ge, leading to negative differential resistance.</pubmed_abstract><journal>ACS photonics</journal><pubmed_title>Plasmon-Driven Hot Electron Transfer at Atomically Sharp Metal-Semiconductor Nanojunctions.</pubmed_title><pmcid>PMC7366502</pmcid><funding_grant_id>EP/M013812/1</funding_grant_id><funding_grant_id>P29729-N27</funding_grant_id><funding_grant_id>758385</funding_grant_id><funding_grant_id>35592PB</funding_grant_id><funding_grant_id>EP/I004343/1</funding_grant_id><funding_grant_id>ANR-12-JS10-0002</funding_grant_id><funding_grant_id>ANR-10-LABX-51-01</funding_grant_id><funding_grant_id>P 29729</funding_grant_id><pubmed_authors>Lugstein A</pubmed_authors><pubmed_authors>Den Hertog MI</pubmed_authors><pubmed_authors>Sistani M</pubmed_authors><pubmed_authors>Momtaz ZS</pubmed_authors><pubmed_authors>Keshmiri H</pubmed_authors><pubmed_authors>Bartmann MG</pubmed_authors><pubmed_authors>Luong MA</pubmed_authors><pubmed_authors>Gusken NA</pubmed_authors><pubmed_authors>Oulton RF</pubmed_authors></additional><is_claimable>false</is_claimable><name>Plasmon-Driven Hot Electron Transfer at Atomically Sharp Metal-Semiconductor Nanojunctions.</name><description>Recent advances in guiding and localizing light at the nanoscale exposed the enormous potential of ultrascaled plasmonic devices. In this context, the decay of surface plasmons to hot carriers triggers a variety of applications in boosting the efficiency of energy-harvesting, photocatalysis, and photodetection. However, a detailed understanding of plasmonic hot carrier generation and, particularly, the transfer at metal-semiconductor interfaces is still elusive. In this paper, we introduce a monolithic metal-semiconductor (Al-Ge) heterostructure device, providing a platform to examine surface plasmon decay and hot electron transfer at an atomically sharp Schottky nanojunction. The gated metal-semiconductor heterojunction device features electrostatic control of the Schottky barrier height at the Al-Ge interface, enabling hot electron filtering. The ability of momentum matching and to control the energy distribution of plasmon-driven hot electron injection is demonstrated by controlling the interband electron transfer in Ge, leading to negative differential resistance.</description><dates><release>2020-01-01T00:00:00Z</release><publication>2020 Jul</publication><modification>2025-04-05T13:48:27.753Z</modification><creation>2025-04-05T13:48:27.753Z</creation></dates><accession>S-EPMC7366502</accession><cross_references><pubmed>32685608</pubmed><doi>10.1021/acsphotonics.0c00557</doi></cross_references></HashMap>