biostudies-literatureVishnevskiy ASMinistry of Science and Higher Education of the Russian FederationNational Natural Science Foundation of ChinaRussian Foundation for Basic ResearchE4484https://www.ebi.ac.uk/biostudies/studies/S-EPMC7601386biostudies-literatureUnknown13(20)Organosilicate glass-based porous low dielectic constant films with different ratios of terminal methyl to bridging organic (methylene, ethylene and 1,4-phenylene) groups are spin-on deposited by using a mixture of alkylenesiloxane with organic bridges and methyltrimethoxysilane, followed by soft baking at 120-200 °C and curing at 430 °C. The films' porosity was controlled by using sacrificial template Brij® L4. Changes of the films' refractive indices, mechanical properties, k-values, porosity and pore structure versus chemical composition of the film's matrix are evaluated and compared with methyl-terminated low-k materials. The chemical resistance of the films to annealing in oxygen-containing atmosphere is evaluated by using density functional theory (DFT). It is found that the introduMaterials (Basel, Switzerland)Effects of Methyl Terminal and Carbon Bridging Groups Ratio on Critical Properties of Porous Organosilicate-Glass Films.PMC76013866187400218-52-520100706-2020-002218-29-27022Seregin DSVishnevskiy ASRasadujjaman MZhang JVorotilov KANaumov SBaklanov MRLeu JChuang WTWu YHfalseEffects of Methyl Terminal and Carbon Bridging Groups Ratio on Critical Properties of Porous Organosilicate-Glass Films.Organosilicate glass-based porous low dielectic constant films with different ratios of terminal methyl to bridging organic (methylene, ethylene and 1,4-phenylene) groups are spin-on deposited by using a mixture of alkylenesiloxane with organic bridges and methyltrimethoxysilane, followed by soft baking at 120-200 °C and curing at 430 °C. The films' porosity was controlled by using sacrificial template Brij® L4. Changes of the films' refractive indices, mechanical properties, k-values, porosity and pore structure versus chemical composition of the film's matrix are evaluated and compared with methyl-terminated low-k materials. The chemical resistance of the films to annealing in oxygen-containing atmosphere is evaluated by using density functional theory (DFT). It is found that the introdu2020-01-01T00:00:00Z2020 Oct2025-04-19T00:41:26.992Z2020-11-03T08:05:15ZS-EPMC76013863305039510.3390/ma13204484