<HashMap><database>biostudies-literature</database><scores/><additional><submitter>Xu J</submitter><funding>Yong Liu</funding><pagination>1029</pagination><full_dataset_link>https://www.ebi.ac.uk/biostudies/studies/S-EPMC8949618</full_dataset_link><repository>biostudies-literature</repository><omics_type>Unknown</omics_type><volume>12(6)</volume><pubmed_abstract>Valence change memory (VCM) attracts numerous attention in memory applications, due to its high stability and low energy consumption. However, owing to the low on/off ratio of VCM, increasing the difficulty of information identification hinders the development of memory applications. We prepared N-doped NbOx:N films (thickness = approximately 15 nm) by pulsed laser deposition at 200 °C. N-doping significantly improved the on/off ratio, retention time, and stability of the Pt/NbOx:N/Pt devices, thus improving the stability of data storage. The Pt/NbOx:N/Pt devices also achieved lower and centralized switching voltage distribution. The improved performance was mainly attributed to the formation of oxygen vacancy (VO) + 2N clusters, which greatly reduced the ionic conductivity and total energ</pubmed_abstract><journal>Nanomaterials (Basel, Switzerland)</journal><pubmed_title>Improved Performance of NbOx Resistive Switching Memory by In-Situ N Doping.</pubmed_title><pmcid>PMC8949618</pmcid><funding_grant_id>11804211</funding_grant_id><funding_grant_id>12074291</funding_grant_id><funding_grant_id>11905119</funding_grant_id><pubmed_authors>Liu Y</pubmed_authors><pubmed_authors>Zou Z</pubmed_authors><pubmed_authors>Zhu Y</pubmed_authors><pubmed_authors>Ma H</pubmed_authors><pubmed_authors>Xiong R</pubmed_authors><pubmed_authors>Wang H</pubmed_authors><pubmed_authors>Xu J</pubmed_authors><pubmed_authors>Wu X</pubmed_authors></additional><is_claimable>false</is_claimable><name>Improved Performance of NbOx Resistive Switching Memory by In-Situ N Doping.</name><description>Valence change memory (VCM) attracts numerous attention in memory applications, due to its high stability and low energy consumption. However, owing to the low on/off ratio of VCM, increasing the difficulty of information identification hinders the development of memory applications. We prepared N-doped NbOx:N films (thickness = approximately 15 nm) by pulsed laser deposition at 200 °C. N-doping significantly improved the on/off ratio, retention time, and stability of the Pt/NbOx:N/Pt devices, thus improving the stability of data storage. The Pt/NbOx:N/Pt devices also achieved lower and centralized switching voltage distribution. The improved performance was mainly attributed to the formation of oxygen vacancy (VO) + 2N clusters, which greatly reduced the ionic conductivity and total energ</description><dates><release>2022-01-01T00:00:00Z</release><publication>2022 Mar</publication><modification>2025-04-22T01:47:30.07Z</modification><creation>2025-04-05T20:06:01.851Z</creation></dates><accession>S-EPMC8949618</accession><cross_references><pubmed>35335842</pubmed><doi>10.3390/nano12061029</doi></cross_references></HashMap>