{"database":"biostudies-literature","file_versions":[],"scores":null,"additional":{"submitter":["Jeong H"],"funding":["National Research Foundation of Korea","National Science Foundation","Office of Naval Research"],"pagination":["20871-20878"],"full_dataset_link":["https://www.ebi.ac.uk/biostudies/studies/S-EPMC9065771"],"repository":["biostudies-literature"],"omics_type":["Unknown"],"volume":["9(36)"],"pubmed_abstract":["The demand for large-area, high-quality synthesis of graphene with chemical vapor deposition (CVD) has increased for the realization of next-generation transparent and flexible optoelectronic applications. In conventional CVD processes, various synthesis parameters can strongly affect the quality of the resultant graphene. In particular, surface engineering of a copper catalyst substrate is one of the most promising pathways for achieving high-quality graphene with excellent reproducibility. For this purpose, simple wet chemical etching of a catalyst substrate without toxic fume byproducts or metal ion residues is desired. Here, we suggest a facile method for preparing a pretreated copper catalyst substrate for highly uniform, large-area CVD graphene growth. This pretreatment method involv"],"journal":["RSC advances"],"pubmed_title":["Highly uniform monolayer graphene synthesis <i>via</i> a facile pretreatment of copper catalyst substrates using an ammonium persulfate solution."],"pmcid":["PMC9065771"],"funding_grant_id":["N000141612685","CBET-1605338","NRF-2017R1C1B2002323","2012026372"],"pubmed_authors":["Hihath J","Chung S","Jeong H","Kim JK","Kim Y","Lee T","Hwang WT","Song Y"],"additional_accession":[]},"is_claimable":false,"name":"Highly uniform monolayer graphene synthesis <i>via</i> a facile pretreatment of copper catalyst substrates using an ammonium persulfate solution.","description":"The demand for large-area, high-quality synthesis of graphene with chemical vapor deposition (CVD) has increased for the realization of next-generation transparent and flexible optoelectronic applications. In conventional CVD processes, various synthesis parameters can strongly affect the quality of the resultant graphene. In particular, surface engineering of a copper catalyst substrate is one of the most promising pathways for achieving high-quality graphene with excellent reproducibility. For this purpose, simple wet chemical etching of a catalyst substrate without toxic fume byproducts or metal ion residues is desired. Here, we suggest a facile method for preparing a pretreated copper catalyst substrate for highly uniform, large-area CVD graphene growth. This pretreatment method involv","dates":{"release":"2019-01-01T00:00:00Z","publication":"2019 Jul","modification":"2025-04-18T14:15:10.507Z","creation":"2025-04-07T00:19:45.096Z"},"accession":"S-EPMC9065771","cross_references":{"pubmed":["35515571"],"doi":["10.1039/c9ra02689d"]}}