<HashMap><database>biostudies-literature</database><scores/><additional><submitter>Wu S</submitter><funding>National Natural Science Foundation of China</funding><pagination>2181-2187</pagination><full_dataset_link>https://www.ebi.ac.uk/biostudies/studies/S-EPMC9077256</full_dataset_link><repository>biostudies-literature</repository><omics_type>Unknown</omics_type><volume>8(4)</volume><pubmed_abstract>The optical and electrical properties of nitride materials are closely related to their crystallographic orientation. Here, we report our effort on crystallographic orientation manipulation of GaN NWs using vapour-liquid-solid hydride vapour phase epitaxy (VLS-HVPE). The growth orientations of the GaN NWs are tuned from the polar &lt;i>c&lt;/i>-axis to the non-polar &lt;i>m&lt;/i>-axis by simply varying the supply of III precursors on various substrates, including &lt;i>c&lt;/i>-, &lt;i>r&lt;/i>, &lt;i>m&lt;/i>-plane sapphire, (111) silicon and (0001) GaN. By varying the size of the Ni/Au catalyst, we found that the catalyst size has a negligible influence on the growth orientation of GaN NWs. All these demonstrate that the growth orientation of the GaN NWs is dominated by the flow rate of the precursor, regardless of </pubmed_abstract><journal>RSC advances</journal><pubmed_title>Crystallographic orientation control and optical properties of GaN nanowires.</pubmed_title><pmcid>PMC9077256</pmcid><funding_grant_id>U1505253</funding_grant_id><funding_grant_id>61306050</funding_grant_id><funding_grant_id>61306051</funding_grant_id><pubmed_authors>Yi X</pubmed_authors><pubmed_authors>Liu Z</pubmed_authors><pubmed_authors>Yan J</pubmed_authors><pubmed_authors>Li J</pubmed_authors><pubmed_authors>Wei T</pubmed_authors><pubmed_authors>Wu S</pubmed_authors><pubmed_authors>Yuan G</pubmed_authors><pubmed_authors>Wang J</pubmed_authors><pubmed_authors>Wang L</pubmed_authors></additional><is_claimable>false</is_claimable><name>Crystallographic orientation control and optical properties of GaN nanowires.</name><description>The optical and electrical properties of nitride materials are closely related to their crystallographic orientation. Here, we report our effort on crystallographic orientation manipulation of GaN NWs using vapour-liquid-solid hydride vapour phase epitaxy (VLS-HVPE). The growth orientations of the GaN NWs are tuned from the polar &lt;i>c&lt;/i>-axis to the non-polar &lt;i>m&lt;/i>-axis by simply varying the supply of III precursors on various substrates, including &lt;i>c&lt;/i>-, &lt;i>r&lt;/i>, &lt;i>m&lt;/i>-plane sapphire, (111) silicon and (0001) GaN. By varying the size of the Ni/Au catalyst, we found that the catalyst size has a negligible influence on the growth orientation of GaN NWs. All these demonstrate that the growth orientation of the GaN NWs is dominated by the flow rate of the precursor, regardless of </description><dates><release>2018-01-01T00:00:00Z</release><publication>2018 Jan</publication><modification>2025-04-26T04:35:26.733Z</modification><creation>2025-04-06T11:14:27.368Z</creation></dates><accession>S-EPMC9077256</accession><cross_references><pubmed>35542617</pubmed><doi>10.1039/c7ra11408g</doi></cross_references></HashMap>