<HashMap><database>biostudies-literature</database><scores/><additional><submitter>Wang J</submitter><funding>Weiguang Xie</funding><pagination>5859</pagination><full_dataset_link>https://www.ebi.ac.uk/biostudies/studies/S-EPMC9457482</full_dataset_link><repository>biostudies-literature</repository><omics_type>Unknown</omics_type><volume>15(17)</volume><pubmed_abstract>Two-dimensional van der Waals crystals (2D vdW) are recognized as one of the potential materials to solve the physical limits caused by size scaling. Here, vdW metal oxide MoO&lt;sub>3&lt;/sub> is applied with the gate dielectric in a 2D field-effect transistor (FET). Due to its high dielectric constant and the good response of MoS&lt;sub>2&lt;/sub> to visible light, we obtained a field effect transistor for photodetection. In general, the device exhibits a threshold voltage near 0 V, Ion/Ioff ratio of 10&lt;sup>5&lt;/sup>, electron mobility about 85 cm&lt;sup>2&lt;/sup> V&lt;sup>-1&lt;/sup> s&lt;sup>-1&lt;/sup> and a good response to visible light, the responsivity is near 5 A/W at low laser power, which shows that MoO&lt;sub>3&lt;/sub> is a potential material as gate dielectric.</pubmed_abstract><journal>Materials (Basel, Switzerland)</journal><pubmed_title>High-&lt;i>κ&lt;/i> van der Waals Oxide MoO&lt;sub>3&lt;/sub> as Efficient Gate Dielectric for MoS&lt;sub>2&lt;/sub> Field-Effect Transistors.</pubmed_title><pmcid>PMC9457482</pmcid><funding_grant_id>2019B15152049</funding_grant_id><funding_grant_id>62174072</funding_grant_id><pubmed_authors>Lai H</pubmed_authors><pubmed_authors>Liu J</pubmed_authors><pubmed_authors>Xie W</pubmed_authors><pubmed_authors>Lu Y</pubmed_authors><pubmed_authors>Huang X</pubmed_authors><pubmed_authors>Liu P</pubmed_authors><pubmed_authors>Wang J</pubmed_authors></additional><is_claimable>false</is_claimable><name>High-&lt;i>κ&lt;/i> van der Waals Oxide MoO&lt;sub>3&lt;/sub> as Efficient Gate Dielectric for MoS&lt;sub>2&lt;/sub> Field-Effect Transistors.</name><description>Two-dimensional van der Waals crystals (2D vdW) are recognized as one of the potential materials to solve the physical limits caused by size scaling. Here, vdW metal oxide MoO&lt;sub>3&lt;/sub> is applied with the gate dielectric in a 2D field-effect transistor (FET). Due to its high dielectric constant and the good response of MoS&lt;sub>2&lt;/sub> to visible light, we obtained a field effect transistor for photodetection. In general, the device exhibits a threshold voltage near 0 V, Ion/Ioff ratio of 10&lt;sup>5&lt;/sup>, electron mobility about 85 cm&lt;sup>2&lt;/sup> V&lt;sup>-1&lt;/sup> s&lt;sup>-1&lt;/sup> and a good response to visible light, the responsivity is near 5 A/W at low laser power, which shows that MoO&lt;sub>3&lt;/sub> is a potential material as gate dielectric.</description><dates><release>2022-01-01T00:00:00Z</release><publication>2022 Aug</publication><modification>2025-04-18T22:41:10.395Z</modification><creation>2025-04-07T10:23:04.18Z</creation></dates><accession>S-EPMC9457482</accession><cross_references><pubmed>36079239</pubmed><doi>10.3390/ma15175859</doi></cross_references></HashMap>