<HashMap><database>biostudies-literature</database><scores/><additional><submitter>Rosova A</submitter><funding>VEGA - Vedecká grantová agentúra MŠVVaŠ SR a SAV -grant agency, Slovakia</funding><pagination>3496</pagination><full_dataset_link>https://www.ebi.ac.uk/biostudies/studies/S-EPMC9565245</full_dataset_link><repository>biostudies-literature</repository><omics_type>Unknown</omics_type><volume>12(19)</volume><pubmed_abstract>In(Ga)N epitaxial layers were grown on on-axis and off-axis (0001) sapphire substrates with an about 1100 nm-thick GaN buffer layer stack using organometallic chemical vapor deposition at 600 °C. The In(Ga)N layers consisted of a thin (~10-25 nm) continuous layer of small conical pyramids in which large conical pyramids with an approximate height of 50-80 nm were randomly distributed. The large pyramids were grown above the edge-type dislocations which originated in the GaN buffer; the dislocations did not penetrate the large, isolated pyramids. The large pyramids were well crystallized and relaxed with a small quantity of defects, such as dislocations, preferentially located at the contact zones of adjacent pyramids. The low temperature (6.5 K) photoluminescence spectra showed one clear m</pubmed_abstract><journal>Nanomaterials (Basel, Switzerland)</journal><pubmed_title>In(Ga)N 3D Growth on GaN-Buffered On-Axis and Off-Axis (0001) Sapphire Substrates by MOCVD.</pubmed_title><pmcid>PMC9565245</pmcid><funding_grant_id>2/0005/22</funding_grant_id><pubmed_authors>Rosova A</pubmed_authors><pubmed_authors>Hasenohrl S</pubmed_authors><pubmed_authors>Gucmann F</pubmed_authors><pubmed_authors>Kuzmik J</pubmed_authors><pubmed_authors>Elias P</pubmed_authors><pubmed_authors>Dobrocka E</pubmed_authors><pubmed_authors>Kucera M</pubmed_authors></additional><is_claimable>false</is_claimable><name>In(Ga)N 3D Growth on GaN-Buffered On-Axis and Off-Axis (0001) Sapphire Substrates by MOCVD.</name><description>In(Ga)N epitaxial layers were grown on on-axis and off-axis (0001) sapphire substrates with an about 1100 nm-thick GaN buffer layer stack using organometallic chemical vapor deposition at 600 °C. The In(Ga)N layers consisted of a thin (~10-25 nm) continuous layer of small conical pyramids in which large conical pyramids with an approximate height of 50-80 nm were randomly distributed. The large pyramids were grown above the edge-type dislocations which originated in the GaN buffer; the dislocations did not penetrate the large, isolated pyramids. The large pyramids were well crystallized and relaxed with a small quantity of defects, such as dislocations, preferentially located at the contact zones of adjacent pyramids. The low temperature (6.5 K) photoluminescence spectra showed one clear m</description><dates><release>2022-01-01T00:00:00Z</release><publication>2022 Oct</publication><modification>2025-04-18T18:32:53.015Z</modification><creation>2025-02-19T01:02:51.56Z</creation></dates><accession>S-EPMC9565245</accession><cross_references><pubmed>36234625</pubmed><doi>10.3390/nano12193496</doi></cross_references></HashMap>