{"database":"biostudies-literature","file_versions":[],"scores":null,"additional":{"omics_type":["Unknown"],"volume":["4(23)"],"submitter":["Zhang Y"],"pubmed_abstract":["Graphene with a large tensile strain is a promising candidate for the new \"straintronics'' applications. The current approaches of strain engineering on graphene are mainly realized by flexible or hollow substrates. In this work, a novel method for strained graphene on a rigid substrate assisted by PDMS stretching and interface adjustments is proposed. The Raman spectra show that the maximum strain of graphene on the SiO<sub>2</sub>/Si substrate is ∼1.5%, and multiple characterizations demonstrate its high cleanness, flatness, integrity, and reliable electrical performance. The successful strain engineering is attributed to the protection of a layer of formvar resin and the interfacial capillary force of the buffering liquid. We believe this technique can advance strain-related fundamental"],"journal":["Nanoscale advances"],"pagination":["5056-5061"],"full_dataset_link":["https://www.ebi.ac.uk/biostudies/studies/S-EPMC9680924"],"repository":["biostudies-literature"],"pubmed_title":["Strain engineering of graphene on rigid substrates."],"pmcid":["PMC9680924"],"pubmed_authors":["Liu J","Chen Z","Zhang Y","Zhao P","Jin Y","Zhao Y","Ren Q"],"additional_accession":[]},"is_claimable":false,"name":"Strain engineering of graphene on rigid substrates.","description":"Graphene with a large tensile strain is a promising candidate for the new \"straintronics'' applications. The current approaches of strain engineering on graphene are mainly realized by flexible or hollow substrates. In this work, a novel method for strained graphene on a rigid substrate assisted by PDMS stretching and interface adjustments is proposed. The Raman spectra show that the maximum strain of graphene on the SiO<sub>2</sub>/Si substrate is ∼1.5%, and multiple characterizations demonstrate its high cleanness, flatness, integrity, and reliable electrical performance. The successful strain engineering is attributed to the protection of a layer of formvar resin and the interfacial capillary force of the buffering liquid. We believe this technique can advance strain-related fundamental","dates":{"release":"2022-01-01T00:00:00Z","publication":"2022 Nov","modification":"2025-04-21T22:29:32.161Z","creation":"2025-04-05T18:50:27.107Z"},"accession":"S-EPMC9680924","cross_references":{"pubmed":["36504754"],"doi":["10.1039/d2na00580h"]}}