biostudies-literatureUnknown4(23)Zhang YGraphene with a large tensile strain is a promising candidate for the new "straintronics'' applications. The current approaches of strain engineering on graphene are mainly realized by flexible or hollow substrates. In this work, a novel method for strained graphene on a rigid substrate assisted by PDMS stretching and interface adjustments is proposed. The Raman spectra show that the maximum strain of graphene on the SiO₂/Si substrate is ∼1.5%, and multiple characterizations demonstrate its high cleanness, flatness, integrity, and reliable electrical performance. The successful strain engineering is attributed to the protection of a layer of formvar resin and the interfacial capillary force of the buffering liquid. We believe this technique can advance strain-related fundamentalNanoscale advances5056-5061https://www.ebi.ac.uk/biostudies/studies/S-EPMC9680924biostudies-literatureStrain engineering of graphene on rigid substrates.PMC9680924Liu JChen ZZhang YZhao PJin YZhao YRen QfalseStrain engineering of graphene on rigid substrates.Graphene with a large tensile strain is a promising candidate for the new "straintronics'' applications. The current approaches of strain engineering on graphene are mainly realized by flexible or hollow substrates. In this work, a novel method for strained graphene on a rigid substrate assisted by PDMS stretching and interface adjustments is proposed. The Raman spectra show that the maximum strain of graphene on the SiO₂/Si substrate is ∼1.5%, and multiple characterizations demonstrate its high cleanness, flatness, integrity, and reliable electrical performance. The successful strain engineering is attributed to the protection of a layer of formvar resin and the interfacial capillary force of the buffering liquid. We believe this technique can advance strain-related fundamental2022-01-01T00:00:00Z2022 Nov2025-04-21T22:29:32.161Z2025-04-05T18:50:27.107ZS-EPMC96809243650475410.1039/d2na00580h