biostudies-literatureChatterjee ADeutsche ForschungsgemeinschaftHorizon 2020 Framework ProgrammeEuropean Metrology Programme for Innovation and Research5317-5325https://www.ebi.ac.uk/biostudies/studies/S-EPMC9686134biostudies-literatureUnknown4(11)The growth parameters for epitaxial growth of graphene on silicon carbide (SiC) have been the focus of research over the past few years. However, besides the standard growth parameters, the influence of the substrate pretreatment and properties of the underlying SiC wafer are critical parameters for optimizing the quality of monolayer graphene on SiC. In this systematic study, we show how the surface properties and the pretreatment determine the quality of monolayer graphene using polymer-assisted sublimation growth (PASG) on SiC. Using the spin-on deposition technique of PASG, several polymer concentrations have been investigated to understand the influence of the polymer content on the final monolayer coverage using wafers of different miscut angles and different polytypes. Confocal laseACS applied electronic materialsImpact of Polymer-Assisted Epitaxial Graphene Growth on Various Types of SiC Substrates.PMC968613418SIB07FOR5242Scherer HWundrack SKruskopf MChatterjee APierz KHinze PStosch RfalseImpact of Polymer-Assisted Epitaxial Graphene Growth on Various Types of SiC Substrates.The growth parameters for epitaxial growth of graphene on silicon carbide (SiC) have been the focus of research over the past few years. However, besides the standard growth parameters, the influence of the substrate pretreatment and properties of the underlying SiC wafer are critical parameters for optimizing the quality of monolayer graphene on SiC. In this systematic study, we show how the surface properties and the pretreatment determine the quality of monolayer graphene using polymer-assisted sublimation growth (PASG) on SiC. Using the spin-on deposition technique of PASG, several polymer concentrations have been investigated to understand the influence of the polymer content on the final monolayer coverage using wafers of different miscut angles and different polytypes. Confocal lase2022-01-01T00:00:00Z2022 Nov2025-04-21T21:27:54.098Z2025-04-05T18:23:38.171ZS-EPMC96861343643939810.1021/acsaelm.2c00989