{"database":"biostudies-literature","file_versions":[],"scores":null,"additional":{"omics_type":["Unknown"],"volume":["13(1)"],"submitter":["Nguyen CT"],"pubmed_abstract":["The integration of bottom-up fabrication techniques and top-down methods can overcome current limits in nanofabrication. For such integration, we propose a gradient area-selective deposition using atomic layer deposition to overcome the inherent limitation of 3D nanofabrication and demonstrate the applicability of the proposed method toward large-scale production of materials. Cp(CH<sub>3</sub>)<sub>5</sub>Ti(OMe)<sub>3</sub> is used as a molecular surface inhibitor to prevent the growth of TiO<sub>2</sub> film in the next atomic layer deposition process. Cp(CH<sub>3</sub>)<sub>5</sub>Ti(OMe)<sub>3</sub> adsorption was controlled gradually in a 3D nanoscale hole to achieve gradient TiO<sub>2</sub> growth. This resulted in the formation of perfectly seamless TiO<sub>2</sub> films with a high-aspect-ratio hole structure. The experimental results were consistent with theoretical calculations based on density functional theory, Monte Carlo simulation, and the Johnson-Mehl-Avrami-Kolmogorov model. Since the gradient area-selective deposition TiO<sub>2</sub> film formation is based on the fundamentals of molecular chemical and physical behaviours, this approach can be applied to other material systems in atomic layer deposition."],"journal":["Nature communications"],"pagination":["7597"],"full_dataset_link":["https://www.ebi.ac.uk/biostudies/studies/S-EPMC9734176"],"repository":["biostudies-literature"],"pubmed_title":["Gradient area-selective deposition for seamless gap-filling in 3D nanostructures through surface chemical reactivity control."],"pmcid":["PMC9734176"],"pubmed_authors":["Shin S","Lee S","Gu B","Nguyen CT","Lee HB","Park J","Cho EH","Kim HS","Shong B","Yu NK","Lee JY"],"additional_accession":[]},"is_claimable":false,"name":"Gradient area-selective deposition for seamless gap-filling in 3D nanostructures through surface chemical reactivity control.","description":"The integration of bottom-up fabrication techniques and top-down methods can overcome current limits in nanofabrication. For such integration, we propose a gradient area-selective deposition using atomic layer deposition to overcome the inherent limitation of 3D nanofabrication and demonstrate the applicability of the proposed method toward large-scale production of materials. Cp(CH<sub>3</sub>)<sub>5</sub>Ti(OMe)<sub>3</sub> is used as a molecular surface inhibitor to prevent the growth of TiO<sub>2</sub> film in the next atomic layer deposition process. Cp(CH<sub>3</sub>)<sub>5</sub>Ti(OMe)<sub>3</sub> adsorption was controlled gradually in a 3D nanoscale hole to achieve gradient TiO<sub>2</sub> growth. This resulted in the formation of perfectly seamless TiO<sub>2</sub> films with a high-aspect-ratio hole structure. The experimental results were consistent with theoretical calculations based on density functional theory, Monte Carlo simulation, and the Johnson-Mehl-Avrami-Kolmogorov model. Since the gradient area-selective deposition TiO<sub>2</sub> film formation is based on the fundamentals of molecular chemical and physical behaviours, this approach can be applied to other material systems in atomic layer deposition.","dates":{"release":"2022-01-01T00:00:00Z","publication":"2022 Dec","modification":"2025-04-05T11:51:37.078Z","creation":"2025-04-05T11:51:37.078Z"},"accession":"S-EPMC9734176","cross_references":{"pubmed":["36494441"],"doi":["10.1038/s41467-022-35428-6"]}}