biostudies-literatureUnknown35(3)Soares JTwo-dimensional (2D) layered materials offer unique properties that make them attractive for continued scaling in electronic and optoelectronic device applications. Successful integration of 2D materials into semiconductor manufacturing requires high-volume and high-precision processes for deposition and etching. Several promising large-scale deposition approaches have been reported for a range of 2D materials, but fewer studies have reported removal processes. Thermal atomic layer etching (ALE) is a scalable processing technique that offers precise control over isotropic material removal. In this work, we report a thermal ALE process for molybdenum disulfide (MoS₂). We show that MoF₆ can be used as a fluorination source, which, when combined with alternating exposureChemistry of materials : a publication of the American Chemical Society927-936https://www.ebi.ac.uk/biostudies/studies/S-EPMC9933903biostudies-literatureThermal Atomic Layer Etching of MoS₂ Using MoF₆ and H₂O.PMC9933903Choudhury DLetourneau SSoares JHues SMElam JWMane AUGraugnard EfalseThermal Atomic Layer Etching of MoS₂ Using MoF₆ and H₂O.Two-dimensional (2D) layered materials offer unique properties that make them attractive for continued scaling in electronic and optoelectronic device applications. Successful integration of 2D materials into semiconductor manufacturing requires high-volume and high-precision processes for deposition and etching. Several promising large-scale deposition approaches have been reported for a range of 2D materials, but fewer studies have reported removal processes. Thermal atomic layer etching (ALE) is a scalable processing technique that offers precise control over isotropic material removal. In this work, we report a thermal ALE process for molybdenum disulfide (MoS₂). We show that MoF₆ can be used as a fluorination source, which, when combined with alternating exposure2023-01-01T00:00:00Z2023 Feb2025-04-04T18:59:56.992Z2025-04-04T18:59:56.992ZS-EPMC99339033681859010.1021/acs.chemmater.2c02549