<HashMap><database>biostudies-literature</database><scores/><additional><submitter>Ding Y</submitter><funding>he Startup funds of Outstanding Talents of UESTC</funding><funding>the National Youth Talents Plan of China</funding><funding>China North Industries Group Corpora- 228 tion Limited</funding><pagination>405</pagination><full_dataset_link>https://www.ebi.ac.uk/biostudies/studies/S-EPMC9966885</full_dataset_link><repository>biostudies-literature</repository><omics_type>Unknown</omics_type><volume>14(2)</volume><pubmed_abstract>Bulk III-nitride materials MN (M = Al, Ga and In) and their alloys have been widely used in high-power electronic and optoelectronic devices, but stable two-dimensional (2D) III-nitride materials, except h-BN, have not been realized yet. A new kind of 2D III-nitride material M2Si2N4 (M = Al, Ga and In) is predicted by choosing Si as the appropriate passivation element. The stability, electronic and optical properties of 2D M2Si2N4 materials are studied systematically based on first-principles calculations. The results show that Al2Si2N4 and Ga2Si2N4 are found to be indirect bandgap semiconductors, while In2Si2N4 is a direct bandgap semiconductor. Moreover, Al2Si2N4 and In2Si2N4 have good absorption ability in the visible light region, while Ga2Si2N4 is an ultraviolet-light-absorbing materi</pubmed_abstract><journal>Micromachines</journal><pubmed_title>Two-Dimensional Octuple-Atomic-Layer M&lt;sub>2&lt;/sub>Si&lt;sub>2&lt;/sub>N&lt;sub>4&lt;/sub> (M = Al, Ga and In) with Long Carrier Lifetime.</pubmed_title><pmcid>PMC9966885</pmcid><funding_grant_id>G05QNQR049</funding_grant_id><funding_grant_id>KLLDT202106</funding_grant_id><funding_grant_id>A1098531023601205</funding_grant_id><pubmed_authors>Yan L</pubmed_authors><pubmed_authors>Zhou L</pubmed_authors><pubmed_authors>Ding Y</pubmed_authors><pubmed_authors>Yao Y</pubmed_authors><pubmed_authors>Zhang J</pubmed_authors><pubmed_authors>Li Q</pubmed_authors><pubmed_authors>Xue K</pubmed_authors></additional><is_claimable>false</is_claimable><name>Two-Dimensional Octuple-Atomic-Layer M&lt;sub>2&lt;/sub>Si&lt;sub>2&lt;/sub>N&lt;sub>4&lt;/sub> (M = Al, Ga and In) with Long Carrier Lifetime.</name><description>Bulk III-nitride materials MN (M = Al, Ga and In) and their alloys have been widely used in high-power electronic and optoelectronic devices, but stable two-dimensional (2D) III-nitride materials, except h-BN, have not been realized yet. A new kind of 2D III-nitride material M2Si2N4 (M = Al, Ga and In) is predicted by choosing Si as the appropriate passivation element. The stability, electronic and optical properties of 2D M2Si2N4 materials are studied systematically based on first-principles calculations. The results show that Al2Si2N4 and Ga2Si2N4 are found to be indirect bandgap semiconductors, while In2Si2N4 is a direct bandgap semiconductor. Moreover, Al2Si2N4 and In2Si2N4 have good absorption ability in the visible light region, while Ga2Si2N4 is an ultraviolet-light-absorbing materi</description><dates><release>2023-01-01T00:00:00Z</release><publication>2023 Feb</publication><modification>2025-04-26T00:11:27.831Z</modification><creation>2025-02-18T23:57:52.568Z</creation></dates><accession>S-EPMC9966885</accession><cross_references><pubmed>36838105</pubmed><doi>10.3390/mi14020405</doi></cross_references></HashMap>