Continuous Large Area Monolayered Molybdenum Disulfide Growth Using Atmospheric Pressure Chemical Vapor Deposition.

ABSTRACT: The growth of large crystallite continuous monolayer materials like molybdenum disulfide (MoS₂) with the desired morphology via chemical vapor deposition (CVD) remains a challenge. In CVD, the complex interplay of various factors like growth temperatures, precursors, and nature of the substrate decides the crystallinity, crystallite size, and coverage area of the grown MoS₂ monolayer. In the present work, we report about the role of weight fraction of molybdenum trioxide (MoO₃), sulfur, and carrier gas flow rate toward nucleation and monolayer growth. The concentration of MoO₃ weight fraction has been found to govern the self-seeding process and decides the density of nucleation sites affecting the morphology and coverage area. A carrier gas flow

SUBMITTER: Prasad RK 

PROVIDER: S-EPMC10061614 | biostudies-literature | 2023 Mar

REPOSITORIES: biostudies-literature