Ultrafast and Resist-Free Nanopatterning of 2D Materials by Femtosecond Laser Irradiation.

ABSTRACT: The performance of two-dimensional (2D) materials is promising for electronic, photonic, and sensing devices since they possess large surface-to-volume ratios, high mechanical strength, and broadband light sensitivity. While significant advances have been made in synthesizing and transferring 2D materials onto different substrates, there is still the need for scalable patterning of 2D materials with nanoscale precision. Conventional lithography methods require protective layers such as resist or metals that can contaminate or degrade the 2D materials and deteriorate the final device performance. Current resist-free patterning methods are limited in throughput and typically require custom-made equipment. To address these limitations, we demonstrate the noncontact and resist-free patterning

SUBMITTER: Enrico A 

PROVIDER: S-EPMC10173691 | biostudies-literature | 2023 May

REPOSITORIES: biostudies-literature