High-Performance Graphene Nanowalls/Si Self-Powered Photodetectors with HfO₂ as an Interfacial Layer.

ABSTRACT: Graphene/silicon (Si) heterojunction photodetectors are widely studied in detecting of optical signals from near-infrared to visible light. However, the performance of graphene/Si photodetectors is limited by defects created in the growth process and surface recombination at the interface. Herein, a remote plasma-enhanced chemical vapor deposition is introduced to directly grow graphene nanowalls (GNWs) at a low power of 300 W, which can effectively improve the growth rate and reduce defects. Moreover, hafnium oxide (HfO₂) with thicknesses ranging from 1 to 5 nm grown by atomic layer deposition has been employed as an interfacial layer for the GNWs/Si heterojunction photodetector. It is shown that the high-k dielectric layer of HfO₂ acts as an electron-blocking and ho

SUBMITTER: Shen Y 

PROVIDER: S-EPMC10222753 | biostudies-literature | 2023 May

REPOSITORIES: biostudies-literature