Hardness, Modulus, and Refractive Index of Plasma-Assisted Atomic-Layer-Deposited Hafnium Oxide Thin Films Doped with Aluminum Oxide.

ABSTRACT: Coatings with tunable refractive index and high mechanical resilience are useful in optical systems. In this work, thin films of HfO₂ doped with Al₂O₃ were deposited on silicon at 300 °C by using plasma-enhanced atomic layer deposition (PE-ALD). The mainly amorphous 60-80 nm thick films consisted Al in the range of 2 to 26 at.%. The refractive indexes varied from 1.69 to 2.08 at the wavelength of 632 nm, and they consistently depended on the composition. The differences were higher in the UV spectral region. At the same time, the hardness of the films was from 12-15 GPa; the modulus was in the range of 160-180 GPa; and the mechanical properties did not have a good correlation with the deposited compositions. The deposition conditions, element contents, and

SUBMITTER: Kull M 

PROVIDER: S-EPMC10223527 | biostudies-literature | 2023 May

REPOSITORIES: biostudies-literature