Assessing the Environmental Impact of Atomic Layer Deposition (ALD) Processes and Pathways to Lower It.

ABSTRACT: Due to concerns on resources depletion, climate change, and overall pollution, the quest toward more sustainable processes is becoming crucial. Atomic layer deposition (ALD) is a versatile technology, allowing for the precise coating of challenging substrates with a nanometer control over thickness. Due to its unique ability to nanoengineer interfaces and surfaces, ALD is widely used in many applications. Although the ALD technique offers the potential to tackle environmental challenges, in particular, considerations regarding the sustainability of renewable energy devices urge for greater efficiency and lower carbon footprint. Indeed, the process itself has currently a consequential impact on the environment, which should ideally be reduced as the technique is implemented in a wider range

SUBMITTER: Weber M 

PROVIDER: S-EPMC10347694 | biostudies-literature | 2023 Jul

REPOSITORIES: biostudies-literature