Atomic layer deposition of Y₂O₃ films using a novel liquid homoleptic yttrium precursor tris(sec-butylcyclopentadienyl)yttrium [Y(^sBuCp)₃] and water.

ABSTRACT: Atomic layer deposition (ALD) of Y₂O₃ thin films was studied using a novel homoleptic yttrium ALD precursor: tris(sec-butylcyclopentadienyl)yttrium [Y(^sBuCp)₃]. Y(^sBuCp)₃ is a liquid at room temperature. The thermogravimetry curve for Y(^sBuCp)₃ is clean, with no indication of decomposition or residue formation. Thermogravimetry-differential thermal analysis measurements showed that Y(^sBuCp)₃ is stable for 18 weeks at 190 °C. Y(^sBuCp)₃ has a homoleptic structure. Thus, a reduction in manufacturing costs is expected compared to those associated with heteroleptic precursors because additional chemical synthesis steps are usually necessary to produce hetero

SUBMITTER: Nishida A 

PROVIDER: S-EPMC10496032 | biostudies-literature | 2023 Sep

REPOSITORIES: biostudies-literature