Wafer-Level Manufacturing of MEMS H₂ Sensing Chips Based on Pd Nanoparticles Modified SnO₂ Film Patterns.

ABSTRACT: In this manuscript, a simple method combining atomic layer deposition and magnetron sputtering is developed to fabricate high-performance Pd/SnO₂ film patterns applied for micro-electro-mechanical systems (MEMS) H₂ sensing chips. SnO₂ film is first accurately deposited in the central areas of MEMS micro hotplate arrays by a mask-assistant method, leading the patterns with wafer-level high consistency in thickness. The grain size and density of Pd nanoparticles modified on the surface of the SnO₂ film are further regulated to obtain an optimized sensing performance. The resulting MEMS H₂ sensing chips show a wide detection range from 0.5 to 500 ppm, high resolution, and good repeatability. Based on the experiments and density functional

SUBMITTER: Zhang Z 

PROVIDER: S-EPMC10502828 | biostudies-literature | 2023 Sep

REPOSITORIES: biostudies-literature