Temperature-Dependent Structural and Electrical Properties of Metal-Organic CVD MoS₂ Films.

ABSTRACT: Metal-Organic CVD method (MOCVD) allows for deposition of ultrathin 2D transition metal dichalcogenides (TMD) films of electronic quality onto wafer-scale substrates. In this work, the effect of temperature on structure, chemical states, and electronic qualities of the MOCVD MoS₂ films were investigated. The results demonstrate that the temperature increase in the range of 650 °C to 950 °C results in non-monotonic average crystallite size variation. Atomic force microscopy (AFM), transmission electron microscopy (TEM), and Raman spectroscopy investigation has established the film crystal structure improvement with temperature increase in this range. At the same time, X-Ray photoelectron spectroscopy (XPS) method allowed to reveal non-stoichiometric phase fraction increase, corre

SUBMITTER: Romanov RI 

PROVIDER: S-EPMC10574732 | biostudies-literature | 2023 Oct

REPOSITORIES: biostudies-literature