Plasmonic Titanium Nitride Nanohole Arrays for Refractometric Sensing.

ABSTRACT: Group IVB metal nitrides have attracted great interest as alternative plasmonic materials. Among them, titanium nitride (TiN) stands out due to the ease of deposition and relative abundance of Ti compared to those of Zr and Hf metals. Even though they do not have Au or Ag-like plasmonic characteristics, they offer many advantages, from high mechanical stability to refractory behavior and complementary metal oxide semiconductor-compatible fabrication to tunable electrical/optical properties. In this study, we utilized reactive RF magnetron sputtering to deposit plasmonic TiN thin films. The flow rate and ratio of Ar/N₂ and oxygen scavenging methods were optimized to improve the plasmonic performance of TiN thin films. The stoichiometry and structure of the TiN thin films were tho

SUBMITTER: Gunaydın BN 

PROVIDER: S-EPMC10684111 | biostudies-literature | 2023 Nov

REPOSITORIES: biostudies-literature