Comparison of Tiling Artifact Removal Methods in Secondary Ion Mass Spectrometry Images.

ABSTRACT: Time-of-flight secondary ion mass spectrometry (ToF-SIMS) imaging is used across many fields for the atomic and molecular characterization of surfaces, with both high sensitivity and high spatial resolution. When large analysis areas are required, standard ToF-SIMS instruments allow for the acquisition of adjoining tiles, which are acquired by rastering the primary ion beam. For such large area scans, tiling artifacts are a ubiquitous challenge, manifesting as intensity gradients across each tile and/or sudden changes in intensity between tiles. Such artifacts are thought to be related to a combination of sample charging, local detector sensitivity issues, and misalignment of the primary ion gun, among other instrumental factors. In this work, we investigated six different computational ti

SUBMITTER: Kandanaarachchi S 

PROVIDER: S-EPMC10688221 | biostudies-literature | 2023 Nov

REPOSITORIES: biostudies-literature