Well-defined in-textile photolithography towards permeable textile electronics.

ABSTRACT: Textile-based wearable electronics have attracted intensive research interest due to their excellent flexibility and breathability inherent in the unique three-dimensional porous structures. However, one of the challenges lies in achieving highly conductive patterns with high precision and robustness without sacrificing the wearing comfort. Herein, we developed a universal and robust in-textile photolithography strategy for precise and uniform metal patterning on porous textile architectures. The as-fabricated metal patterns realized a high precision of sub-100 µm with desirable mechanical stability, washability, and permeability. Moreover, such controllable coating permeated inside the textile scaffold contributes to the significant performance enhancement of miniaturized devices and elec

SUBMITTER: Wang P 

PROVIDER: S-EPMC10828459 | biostudies-literature | 2024 Jan

REPOSITORIES: biostudies-literature