Kinetics formulation for Two-Dimensional Growth Behavior of Water/Ice Interface on Si Substrate.

ABSTRACT: Sublimation drying is used in the drying process of semiconductor device manufacturing. However, the solidification behavior mechanics of sublimation agents on substrates has not been clarified. Therefore, the properties of solidified films within substrate surfaces can become nonuniform, leading to their collapse. This study aimed to analyze the interface growth behavior during the cooling and solidification of a water/ice system as a basic case and to clarify the dynamic mechanism of the solidification behavior of liquid films on Si substrates. The solidification behavior of a water/ice system on Si substrates was captured on a video at different cooling rates. The recorded video was subjected to a digital image analysis to examine the crystal morphology and quantify the interface growth

SUBMITTER: Hanawa Y 

PROVIDER: S-EPMC10906482 | biostudies-literature | 2024 Feb

REPOSITORIES: biostudies-literature