Controllable physicochemical properties of WO_x thin films grown under glancing angle.

ABSTRACT: In this work, various physicochemical properties are investigated in nanostructured WO_x thin films prepared by radio-frequency magnetron sputtering for optoelectronic applications. A glancing angle of 87° is employed to grow films of different thicknesses, which are then exposed to post-growth annealing. Detailed local probe analyses in terms of morphology and work function of WO_x films are carried out to investigate thickness-dependent property modulations of the as-deposited and annealed films. The analyses show a reasonably good correlation with photoelectron spectroscopic measurements on the films and the bulk I-V characteristics acquired on a series of WO_x/p-Si heterojunction diodes. The presence of a critical WO

SUBMITTER: Mandal R 

PROVIDER: S-EPMC10999991 | biostudies-literature | 2024

REPOSITORIES: biostudies-literature