Millisecond X-ray reflectometry and neural network analysis: unveiling fast processes in spin coating.

ABSTRACT: X-ray reflectometry (XRR) is a powerful tool for probing the structural characteristics of nanoscale films and layered structures, which is an important field of nanotechnology and is often used in semiconductor and optics manufacturing. This study introduces a novel approach for conducting quantitative high-resolution millisecond monochromatic XRR measurements. This is an order of magnitude faster than in previously published work. Quick XRR (qXRR) enables real time and in situ monitoring of nanoscale processes such as thin film formation during spin coating. A record qXRR acquisition time of 1.4 ms is demonstrated for a static gold thin film on a silicon sample. As a second example of this novel approach, dynamic in situ measurements are performed during PMMA spin coating o

SUBMITTER: Schumi-Marecek D 

PROVIDER: S-EPMC11001405 | biostudies-literature | 2024 Apr

REPOSITORIES: biostudies-literature