Ethanol Solvation of Polymer Residues in Graphene Solution-Gated Field Effect Transistors.

ABSTRACT: The persistence of photoresist residues from microfabrication procedures causes significant obstacles in the technological advancement of graphene-based electronic devices. These residues induce undesired chemical doping effects, diminish carrier mobility, and deteriorate the signal-to-noise ratio, making them critical in certain contexts, including sensing and electrical recording applications. In graphene solution-gated field-effect transistors (gSGFETs), the presence of polymer contaminants makes it difficult to perform precise electrical measurements, introducing response variability and calibration challenges. Given the absence of viable short to midterm alternatives to polymer-intensive microfabrication techniques, a postpatterning treatment involving THF and ethanol solvents was eva

SUBMITTER: Merino JP 

PROVIDER: S-EPMC11191359 | biostudies-literature | 2024 Jun

REPOSITORIES: biostudies-literature