Disclosing Topographical and Chemical Patterns in Confined Films of High-Molecular-Weight Block Copolymers under Controlled Solvothermal Annealing.

ABSTRACT: The microphase separation of high-molecular-weight block copolymers into nanostructured films is strongly dependent on the surface fields. Both, the chain mobility and the effective interaction parameters can lead to deviations from the bulk morphologies in the structures adjacent to the substrate. Resolving frustrated morphologies with domain period L₀ above 100 nm is an experimental challenge. Here, solvothermal annealing was used to assess the contribution of elevated temperatures of the vapor T_v and of the substrate T_s on the evolution of the microphase-separated structures in thin films symmetric of polystyrene-b-poly(2vinylpyridine) block copolymer (PS-PVP) with L₀ about 120 nm. Pronounced topographic mesh-like and stripe patterns develop o

SUBMITTER: Cheng X 

PROVIDER: S-EPMC11243801 | biostudies-literature | 2024 Jul

REPOSITORIES: biostudies-literature