Nanomechanical inhomogeneities in CVA-deposited titanium nitride thin films: Nanoindentation and finite element method investigations.

ABSTRACT: Refractory metals that can withstand at high temperatures and harsh conditions are of utmost importance for solar-thermal and energy storage applications. Thin films of TiN have been deposited using cathodic vacuum arc deposition at relatively low temperatures ∼300 °C using the substrate bias ∼ -60 V. The nanomechanical properties of these films were investigated using nanoindentation and the spatial fluctuations were observed. The nanoindentation results were simulated using finite element method through Johnson-Cook model. A parametric study was conducted, and 16 different models were simulated to predict the hardening modulus, hardening exponent, and yield stress of the deposited film. The predicted values of elastic modulus, yield stress, hardening modulus and hardening exponent as 246

SUBMITTER: Sharma NK 

PROVIDER: S-EPMC11252795 | biostudies-literature | 2024 Jun

REPOSITORIES: biostudies-literature