Wavelength-multiplexed multi-mode EUV reflection ptychography based on automatic differentiation.

ABSTRACT: Ptychographic extreme ultraviolet (EUV) diffractive imaging has emerged as a promising candidate for the next generationmetrology solutions in the semiconductor industry, as it can image wafer samples in reflection geometry at the nanoscale. This technique has surged attention recently, owing to the significant progress in high-harmonic generation (HHG) EUV sources and advancements in both hardware and software for computation. In this study, a novel algorithm is introduced and tested, which enables wavelength-multiplexed reconstruction that enhances the measurement throughput and introduces data diversity, allowing the accurate characterisation of sample structures. To tackle the inherent instabilities of the HHG source, a modal approach was adopted, which represents the cross-density fun

SUBMITTER: Shao Y 

PROVIDER: S-EPMC11333750 | biostudies-literature | 2024 Aug

REPOSITORIES: biostudies-literature