Morphological and molecular control of chemical vapor deposition (CVD) polymerized polythiophene thin films.

ABSTRACT: Oxidative chemical vapor deposition (oCVD) has emerged as one of the most promising techniques for conjugated polymer deposition, especially for unsubstituted polythiophene thin films. oCVD overcomes the insolubility challenge that unsubstituted polythiophene (PT) presents and adds the ability to control morphological and molecular structure. This control is important for enhancing the performance of devices which incorporate organic conductors. In this work, Raman spectroscopy, UV-vis spectroscopy, and AFM reveal that the relative amount of distortion in the polymer chains, the conjugation length and the film roughness are all affected by the CVD deposition conditions, in particular the reactor pressure. PT films deposited at 150 mT and 300 mT are found to have lower chain distortion, lon

SUBMITTER: Smith PM 

PROVIDER: S-EPMC11457158 | biostudies-literature | 2024 Oct

REPOSITORIES: biostudies-literature