2D Super-Resolution Metrology Based on Superoscillatory Light.

ABSTRACT: Progress in the semiconductor industry relies on the development of increasingly compact devices consisting of complex geometries made from diverse materials. Precise, label-free, and real-time metrology is needed for the characterization and quality control of such structures in both scientific research and industry. However, optical metrology of 2D sub-wavelength structures with nanometer resolution remains a major challenge. Here, a single-shot and label-free optical metrology approach that determines 2D features of nanostructures, is introduced. Accurate experimental measurements with a random statistical error of 18 nm (λ/27) are demonstrated, while simulations suggest that 6 nm (λ/81) may be possible. This is far beyond the diffraction limit that affects conventional metrology. This

SUBMITTER: Wang Y 

PROVIDER: S-EPMC11481175 | biostudies-literature | 2024 Oct

REPOSITORIES: biostudies-literature