Growth Behavior of Ni on Hydrogen-Etched WS<sub>2</sub> Surface.
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ABSTRACT: Transition metal dichalcogenides (TMDs) are 2D materials in which the layers are stacked together by van der Waals forces. Although TMDs are expected to be promising for electronic applications, forming a uniform electrode on them is challenging because of the low adhesion forces between metals and TMDs. This study focuses on improving the quality of metal electrodes by introducing atomic H to create surface defects, using Ni on WS2 as an example. The detailed effects of H etching and subsequent Ni growth were investigated using scanning tunneling microscopy (STM) and synchrotron-based X-ray photoemission (XPS) techniques. Our studies reveal that introducing point defects of ∼3.05 × 1011 cm-2 on the WS2 surface, results in a significant shift in
SUBMITTER: Liu HT
PROVIDER: S-EPMC11492163 | biostudies-literature | 2024 Oct
REPOSITORIES: biostudies-literature
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