Highly uniform silicon nanopatterning with deep-ultraviolet femtosecond pulses.

ABSTRACT: The prospect of employing nanophotonic methods for controlling photon-electron interactions has ignited substantial interest within the particle accelerator community. Silicon-based integrated dielectric laser acceleration (DLA) has emerged as a viable option by leveraging localized photonic effects to emit, accelerate, and measure electron bunches using exclusively light. Here, using highly regular nanopatterning over large areas while preserving the crystalline structure of silicon is imperative to enhance the efficiency and yield of photon-electron effects. While several established fabrication techniques may be used to produce the required silicon nanostructures, alternative techniques are beneficial to enhance scalability, simplicity and cost-efficiency. In this study, we demonstrate

SUBMITTER: Granados E 

PROVIDER: S-EPMC11501060 | biostudies-literature | 2024 Sep

REPOSITORIES: biostudies-literature