Advanced optical nanolithography by enhanced transmission through bull's eye nanostructured meta-mask.

ABSTRACT: Plasmonic optical nanolithography using extraordinary optical transmission through a metallic nanohole mask has been actively applied to the high-resolution fabrication of nanostructures over a large area. Although there have been studies on improving the nanostructure fabrication performance in optical nanolithography, such as on adjustable external gap spacing, additional performance enhancement is required for practical applications and commercialization of large-area and high-resolution nanostructure array fabrication techniques. In this study, we design and apply a plasmonic bull's eye nanostructured meta-mask to enhance the performance of optical nanolithography. Through simulation results and experimental verification, it is confirmed that advanced optical nanolithography using the

SUBMITTER: Kim T 

PROVIDER: S-EPMC11501246 | biostudies-literature | 2023 May

REPOSITORIES: biostudies-literature