Growth and atomic oxygen erosion resistance of Al₂O₃-doped TiO₂ thin film formed on polyimide by atomic layer deposition.

ABSTRACT: Polyimide (PI) coated with atomic layer deposition (ALD) thin films shows promising potential for applications in extreme environments. To achieve a high quality ultrathin ALD coating on the PI surface, Al-doped ALD-TiO₂ (ATO) films were deposited on the alkaline hydrothermally activated PI surfaces. The nucleation and growth of ATO films were studied by XPS monitoring and SEM observation. The incorporation of aluminum introduced additional active sites that acted as a seed layer, promoting the adsorption and growth of titanium oxide. This effectively compensated for the defects in the TiO₂ film, resulting in the formation of a continuously growing conformal film on the PI surface. After 200 ALD cycles, the ATO film deposited on PI exhibits excellent water vapor barri

SUBMITTER: Yan C 

PROVIDER: S-EPMC11526820 | biostudies-literature | 2024 Oct

REPOSITORIES: biostudies-literature