Microscale Metal Patterning on Any Substrate: Exploring the Potential of Poly(dopamine) Films in High Resolution, High Contrast, Conformal Lithography.

ABSTRACT: We have explored the potential of poly(dopamine) (PDA) thin films as versatile, high resolution conformal photoresists, using catalytic photoreduction of silver ions to micropattern the film. The combination of photosensitivity, biocompatibilty, and straightforward deposition under mild conditions into thin (∼45 nm) conformal coatings on nearly any material makes PDA films of interest in lithographic patterning on highly nonplanar geometries as well as on soft and biological materials where standard photoresists cannot be used. PDA and poly(norepinephrine) (PNE) films deposited with a standard autoxidation process were investigated along with PDA film deposited with a fast oxidation (FO) technique. Notably, we find that nonspecific deposition of silver off the lithographic pattern is stron

SUBMITTER: Kunkel ED 

PROVIDER: S-EPMC11622185 | biostudies-literature | 2024 Dec

REPOSITORIES: biostudies-literature