Photonic crystal L3 cavity laser fabricated using maskless digital photolithography.

ABSTRACT: Projection photolithography using an extreme-ultraviolet light source is the core technology that has enabled patterning on the scale of a few nanometers that is required for modern electronic chips. However, this high-end system is neither affordable nor needed for photonics where critical feature sizes are of 100s of nanometers (or of submicron). Although electron-beam lithography can provide a means for photonic device fabrication, it suffers from extremely low throughput. Therefore, a lithographic technique for submicron pattern generation at high throughput and low cost is in high demand. This group recently showed that maskless digital photolithography (MDPL), a convenient and versatile photolithographic technique that requires no photomask, could potentially address this demand by d

SUBMITTER: Kang M 

PROVIDER: S-EPMC11636002 | biostudies-literature | 2022 May

REPOSITORIES: biostudies-literature