Room-Temperature Deposition of δ-Ni₅Ga₃ Thin Films and Nanoparticles via Magnetron Sputtering.

ABSTRACT: Magnetron sputtering is a versatile method for investigating model system catalysts thanks to its simplicity, reproducibility, and chemical-free synthesis process. It has recently emerged as a promising technique for synthesizing δ-Ni₅Ga₃ thin films. Physically deposited thin films have significant potential to clarify certain aspects of catalysts by eliminating parameters such as particle size dependence, metal-support interactions, and the presence of surface ligands. In this work, we demonstrate the potential of magnetron sputtering for the synthesis and analysis of thin film catalysts, using Ni₅Ga₃ as a model system. Initially, deposition conditions were optimized by varying the deposition pressure, followed by an investigation of the tempera

SUBMITTER: Romeggio F 

PROVIDER: S-EPMC11656207 | biostudies-literature | 2024 Dec

REPOSITORIES: biostudies-literature