Characterizing the stability of ultra-thin metal oxide catalyst films in non-thermal plasma CO<sub>2</sub> reduction reactions.
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ABSTRACT: The use of metal oxide catalysts to enhance plasma CO2 reduction has seen significant recent development towards processes to reduce greenhouse gas emissions and produce renewable chemical feedstocks. While plasma reactors are effective at producing the intended chemical transformations, the conditions can result in catalyst degradation. Atomic layer deposition (ALD) can be used to synthesize complex, hierarchically structured metal oxide plasma catalysts that, while active for plasma CO2 reduction, are potentially vulnerable to degradation due to their high surface area and nanoscopic thickness. In this work, we characterized the effects of extended non-thermal, glow discharge plasma exposure on ALD synthesized, ultra-thin film (<30 nm) TiO2 and ZnO cataly
SUBMITTER: Conlin SK
PROVIDER: S-EPMC11664254 | biostudies-literature | 2025 Jan
REPOSITORIES: biostudies-literature
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